PDS-H115 Photoresist Dispensing Pump Parameters

Substantial saving of resist

The use of a high-torque stepper motor as the drive source results in a consistent discharge volume, unimpeded by filter clogging or viscosity change. A repeatable accuracy (0.3%) of discharge is maintained.
･ Repeated precision: ±0.3% (F.S.)
･ Linearity: ±0.5% (F.S.)
･ Resolution: 0.01 ml or below

The PDS-H115 Photoresist Dispensing pump portion is of tubephragm structure wetted internals are flat and smooth, with a small dead volume. Because the system hardly has a place that allows liquid resist to dwell, production of particles is prevented.

Usable for a variety of coating processes

Since the discharge velocity can be changed freely in a shot, the system is capable of dealing with a variety of resist coating processes including application of a very small amount or in a very short period of time.

Reduction of Downtime

A discharge amount and a discharge time can be set only by entering values in the controller. It can save operator’s time and labor and reduce downtime.

Specification

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